The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Sep. 23, 2024
Applicant:

Realtek Semiconductor Corp., Hsinchu, TW;

Inventors:

Li-Heng Su, Hsinchu, TW;

Chih-Shun Fan Chiang, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 19/51 (2014.01); H04N 7/01 (2006.01);
U.S. Cl.
CPC ...
H04N 19/51 (2014.11); H04N 7/0127 (2013.01);
Abstract

A motion estimation and motion compensation (MEMC) system with calibration function and a parameter calibration method thereof relate to a parameter calibration method for MEMC. The parameter calibration method is configured to calibrate an MEMC program. The parameter calibration method includes storing a default feature set; performing the MEMC program on a calibrated video to fetch a testing feature set; generating a calibration parameter according to a difference vale between the default feature set and the testing feature set; and adjusting a correction parameter of the MEMC calibration program in accordance with the calibration parameter.


Find Patent Forward Citations

Su, Li-Heng. (2026). Motion estimation and motion compensation (memc) system with correction function and method for calibrating parameters thereof (U.S. Patent No. 12574539). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12574539

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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