The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Mar. 29, 2024
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Ryan T. Downey, San Jose, CA (US);

James L'heureux, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32495 (2013.01); H01J 37/3211 (2013.01); H01J 37/32467 (2013.01); H01J 2237/0213 (2013.01);
Abstract

A plasma source is provided including: a dielectric tube having one or more interior surfaces extending from a first opening at a first end of the dielectric tube to a second opening at a second end of the dielectric tube; a coil antenna disposed around the dielectric tube; and a dielectric liner positioned inside the dielectric tube. The dielectric liner includes one or more outer surfaces. The dielectric liner is disposed around an interior plasma-generating volume of the plasma source. The dielectric liner extends from a first end of the dielectric liner to a second end of the dielectric liner, and the dielectric liner covers the one or more interior surfaces of the dielectric tube.


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