The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2026
Filed:
Nov. 21, 2022
International Business Machines Corporation, Armonk, NY (US);
Xiao Feng Ji, Shanghai, CN;
Yu Hong Li, Shanghai, CN;
Jian Jun Wang, Xi'an, CN;
Yuan Jin, Shanghai, CN;
Li Ping Wang, Shanghai, CN;
International Business Machines Corporation, Armonk, NY (US);
Abstract
Aspects of the invention include techniques for intimacy-based masking of three dimensional (3D) face landmarks within a metaverse. A non-limiting example method includes determining a degree of intimacy R between a first user and a second user responsive to a first avatar of the first user being observed by a second avatar of the second user in a virtual environment. An initial set of M landmarks of a feature of the first avatar is determined and N landmarks are randomly selected from M for masking. The N landmarks are replaced with random noise sampled with a unit normal distribution to define a set of noised landmarks X that are then iteratively denoised to define a set of denoised landmarks D. A masked version of the first avatar is presented to the second user by modifying the feature of the first avatar with the set of denoised landmarks D.