The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2026
Filed:
Mar. 19, 2024
Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;
Kaimo Hu, Shenzhen, CN;
Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;
Abstract
This application provides a polygon correction method and apparatus, a polygon generation method and apparatus, a device, and a computer-readable storage medium. The polygon correction method includes: obtaining a to-be-corrected polygon, and generating at least two simple polygons based on an original outer boundary of the to-be-corrected polygon; determining an inclusion relationship between the at least two simple polygons; determining at least one first simple polygon as a new outer boundary of the corrected polygon from the at least two simple polygons based on the inclusion relationship between the at least two simple polygons; determining an internal hole corresponding to each first simple polygon based on at least one of an original hole of the to-be-corrected polygon and a second simple polygon; and generating each corrected polygon based on each first simple polygon and the internal hole respectively corresponding to each first simple polygon.