The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2026
Filed:
Dec. 02, 2021
International Business Machines Corporation, Armonk, NY (US);
Stan Kevin Daley, Espanola, NM (US);
Sandipan Sengupta, Kolkata, IN;
Raman Harishankar, Blacklick, OH (US);
Lucia Larise Stavarache, Columbus, OH (US);
Charbak Chatterjee, Kolkata, IN;
Chinmohan Biswas, Kolkata, IN;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A system and method including building propensity inclination dimensions of an affinity cluster, the propensity inclination dimensions maintained at a group profile level of the affinity cluster, identifying next best priority signals based on influencing events to determine a next best priority, applying a predictive algorithm to derive an influencing index, which is used to determine a tolerance level of the affinity cluster, deriving a duration of time of the tolerance level, and determining a critical mass of the affinity cluster required to achieve an objective of an organization.