The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2026
Filed:
Feb. 06, 2023
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/4099 (2006.01); G05B 13/02 (2006.01);
U.S. Cl.
CPC ...
G05B 19/4099 (2013.01); G05B 13/0265 (2013.01); G05B 2219/45028 (2013.01);
Abstract
A reliable lithography model generating method reflecting a mask bias variation and a mask manufacturing method including the lithography model generating method are provided. The lithography model generating method includes preparing basic image data for learning, preparing transform image data that indicates a mask bias variation, generating a lithography model by performing deep learning by combining the basic image data and the transform image data, and verifying the lithography model.
Yeo, Sangchul. (2026). Lithography model generating method based on deep learning, and mask manufacturing method including the lithography model generating method (U.S. Patent No. 12572129). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12572129
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile