The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Jul. 13, 2020
Applicant:

Hoya Corporation, Tokyo, JP;

Inventors:

Masanori Nakagawa, Tokyo, JP;

Takashi Uchida, Tokyo, JP;

Assignee:

HOYA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/24 (2012.01); G03F 1/38 (2012.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); G03F 1/38 (2013.01);
Abstract

A substrate with a conductive film for manufacturing a reflective mask, the substrate comprising a conductive film having excellent chemical resistance and a small surface roughness (Rms), is obtained. A substrate with a conductive film comprises a conductive film on one of two main surfaces of the substrate. The conductive film comprises chromium. The conductive film comprises a structure in which a lower layer and an upper layer are layered in this order from the substrate side. The lower layer is amorphous. The upper layer has a crystallinity.


Find Patent Forward Citations

Nakagawa, Masanori. (2026). Substrate with conductive film, reflective mask blank, reflective mask, and method for manufacturing semiconductor device (U.S. Patent No. 12572065). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12572065

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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