The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Apr. 29, 2022
Applicant:

Board of Regents, the University of Texas System, Austin, TX (US);

Inventors:

Alexander A. Demkov, Austin, TX (US);

John Elliott Ortmann, Jr., Austin, TX (US);

Agham Posadas, Round Rock, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/12 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01); C30B 23/02 (2006.01); C30B 29/32 (2006.01); G02B 6/13 (2006.01);
U.S. Cl.
CPC ...
G02B 6/12002 (2013.01); C23C 14/082 (2013.01); C23C 14/083 (2013.01); C23C 14/34 (2013.01); C30B 23/025 (2013.01); C30B 29/32 (2013.01); G02B 6/131 (2013.01); G02B 2006/12038 (2013.01); G02B 2006/12047 (2013.01); G02B 2006/12061 (2013.01);
Abstract

Various embodiments provide for systems and techniques for the successful fabrication of metal oxide (TMO)-on-glass layer stacks via direct deposition. The resulting samples feature epitaxial, strontium titanate (STO) or barium titanate (BTO) films on silicon dioxide (SiO) layers, forming STO- or BTO-buffered SiOpseudo-substrates. As the integration of TMO films on silicon rely on an STO or BTO buffer layer, a wide variety of TMO-based integrated devices (e.g., circuits, waveguides, etc.) can be fabricated from the TMO-on-glass platform of the present technology. Moreover, the STO, or the BTO, survives the fabrication process without a corresponding degradation of crystalline quality, as evidenced by various objective measures.


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