The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Nov. 25, 2020
Applicant:

Horiba Stec, Co., Ltd., Kyoto, JP;

Inventors:

Masanori Terasaka, Irvine, CA (US);

Ryoichi Homma, Irvine, CA (US);

Fernandez Alexander, Irvine, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/52 (2006.01); C23C 16/56 (2006.01); G01F 1/00 (2022.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/52 (2013.01); C23C 16/56 (2013.01); G01F 1/00 (2013.01); H01L 21/67069 (2013.01);
Abstract

There is provided a control valve that is provided on a flow path along which flows a source fluid which is a liquid source or a source gas obtained by vaporizing a liquid source, a pressure sensor that is provided on a downstream side of the control valve, a flow rate sensor that measures a flow rate of the source fluid, and a valve controller that, while reducing a deviation between a set pressure and a measured pressure measured by the pressure sensor, controls the control valve such that a measured flow rate measured by the flow rate sensor is equal to or less than a limit flow rate which is a flow rate that is set based on an upper limit flow rate at which the liquid source can still be vaporized.


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