The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2026
Filed:
Jun. 20, 2022
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Bencherki Mebarki, Santa Clara, CA (US);
Thai Cheng Chua, Cupertino, CA (US);
Christian W. Valencia, Alhambra, CA (US);
Joung Joo Lee, San Jose, CA (US);
Xianmin Tang, San Jose, CA (US);
Xiao Chen, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/27 (2006.01); C23C 16/511 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/274 (2013.01); C23C 16/511 (2013.01); C23C 16/52 (2013.01); C23C 16/56 (2013.01);
Abstract
A method of forming graphene layers is disclosed. The method includes precleaning the substrate with a plasma formed from an argon- and hydrogen-containing gas, followed by forming a graphene layer by exposing the substrate to a microwave plasma to form a graphene layer on the substrate. The microwave plasma comprises hydrocarbon and hydrogen radicals. The substrate is then cooled. A capping layer may also be formed.