The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2026
Filed:
Feb. 26, 2024
Applicant:
Rasirc, Inc., San Diego, CA (US);
Inventors:
Jeffrey J. Spiegelman, San Diego, CA (US);
Gaku Tsuchibuchi, Boulder, CO (US);
Hayato Murata, Ibaraki, JP;
Hiroshi Taka, Ibaraki, JP;
Assignee:
RASIRC, Inc., San Diego, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09C 1/28 (2006.01); C08J 7/12 (2006.01); C09C 3/04 (2006.01); C23C 14/02 (2006.01); C23C 16/02 (2006.01);
U.S. Cl.
CPC ...
C08J 7/123 (2013.01); C09C 1/28 (2013.01); C09C 3/048 (2013.01); C08J 2323/30 (2013.01); C08J 2327/22 (2013.01); C08J 2367/02 (2013.01); C08J 2371/08 (2013.01); C23C 14/02 (2013.01); C23C 16/02 (2013.01);
Abstract
The techniques described herein relate to hydrogen peroxide plasma surface modification. In some embodiments, a method includes providing a mixture including hydrogen peroxide vapor from a source, wherein a concentration of the hydrogen peroxide vapor in the mixture is substantially stable over time. The method further includes forming a hydrogen peroxide plasma from the mixture and exposing a material to the hydrogen peroxide plasma in a chamber.