The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Jan. 18, 2023
Applicants:

Dongwoo Fine-chem Co., Ltd., Jeollabuk-do, KR;

Ecoprohn Co., Ltd., Chungcheongbuk-do, KR;

Inventors:

Dong Ki Kim, Jeollabuk-do, KR;

Young Chul Park, Jeollabuk-do, KR;

Eun Sang Lee, Daejeon, KR;

Sung Mook Choi, Gyeonggi-do, KR;

Assignees:

DONGWOO FINE-CHEM CO., LTD., Jeollabuk-do, KR;

EcoProHN Co., LTD., Chungcheongbuk-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/10 (2006.01); C08J 5/18 (2006.01); C08L 79/08 (2006.01); H10P 52/00 (2026.01); H10P 72/70 (2026.01);
U.S. Cl.
CPC ...
C08G 73/1007 (2013.01); C08G 73/105 (2013.01); C08J 5/18 (2013.01); C08L 79/08 (2013.01); H10P 52/00 (2026.01); H10P 72/7402 (2026.01); C08J 2379/08 (2013.01); C08L 2203/16 (2013.01); H10P 72/7412 (2026.01); H10P 72/744 (2026.01);
Abstract

A polyimide precursor composition according to an exemplary embodiment includes an imide precursor having an organic group derived from a cyclic ether group-containing compound. A polyimide film formed using the polyimide precursor composition has improved heat resistance and mechanical properties, and has high absorbance in a wavelength range in an ultraviolet region.


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Kim, Dong. (2026). Polyimide precursor composition, polyimide film formed from the same and method of manufacturing semiconductor device using the same (U.S. Patent No. 12570801). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12570801

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