The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2026
Filed:
Dec. 20, 2021
Wacker Chemie Ag, Munich, DE;
Christoph Dräger, Munich, DE;
Moritz Becker, Munich, DE;
Michael Fricke, Munich, DE;
Alena Kalyakina, Munich, DE;
Claudia Kleinlein, Munich, DE;
Sebastian Kneissl, Munich, DE;
Sebastian Suckow, Munich, DE;
Jan Tillmann, Munich, DE;
Wacker Chemie AG, Munich, DE;
Abstract
A process for producing silicon-containing materials. Where the silicon-containing materials are produced by thermal decomposition of silicon precursors in the presence of porous particles and silicon is deposited within pores and on a surface of the porous particles. The thermal decomposition of the silicon precursors takes place in the reaction zone of a gas-traversed reactor and the particles are circulated in the reaction zone during the thermal decomposition by using a stirrer which is close-clearance in the heated regions and the stirring mechanism is in close-clearance in accordance with equation 1