The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2026
Filed:
Oct. 27, 2021
Arkema France, Colombes, FR;
Quentin Pineau, Serquigny, FR;
Charlotte Herdt, Serquigny, FR;
Sébastien Jun Mougnier, Serquigny, FR;
ARKEMA FRANCE, Puteaux, FR;
Abstract
The invention relates to a multilayer structure comprising a textile layer comprising at least one polymer chosen from a polyamide and a copolymer containing polyamide blocks and polyether blocks, and combinations thereof; and a film comprising at least one copolymer containing polyamide blocks and polyether blocks, the polyether blocks comprising polyethylene glycol blocks, the polyethylene glycol blocks representing at least 40% by mass relative to the mass of the film; in which the film adheres to the textile layer via a copolyamide. The invention also relates to a process for manufacturing said multilayer structure, to a process for recycling said multilayer structure and also to an article comprising said multilayer structure.