The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Sep. 15, 2020
Applicant:

Meinan Machinery Works, Inc., Aichi, JP;

Inventor:
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 21/14 (2006.01);
U.S. Cl.
CPC ...
B24B 21/14 (2013.01);
Abstract

Cleaning water CW is supplied to the outer surface of a draining rollfrom a pipearranged above the draining rollthat is in pressure contact with a contact rollvia a polishing belt PB. Accordingly, the cleaning water CW adheres evenly to the outer surface of the draining rollin the longitudinal direction along with the rotation of the draining roll. Then, the cleaning water CW sufficiently adhering to the outer peripheral surface of the draining rollis carried to a contact portionbetween the draining rolland the polishing belt PB, and cleans the abrasive surface of the polishing belt PB. As a result, it is possible to well reduce the occurrence of uneven cleaning on the abrasive surface, and to further improve the polishing effects of a polishing apparatus


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Hasegawa, Yasumasa. (2026). Polishing apparatus, polishing method, and cleaning liquid supply device (U.S. Patent No. 12569954). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12569954

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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