The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2026
Filed:
Dec. 19, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Anton V Baryshnikov, Campbell, CA (US);
Aykut Aydin, Sunnyvale, CA (US);
Zubin Huang, Santa Clara, CA (US);
Rui Cheng, San Jose, CA (US);
Yi Yang, San Jose, CA (US);
Diwakar Kedlaya, San Jose, CA (US);
Venkatanarayana Shankaramurthy, San Jose, CA (US);
Krishna Nittala, San Jose, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A target concentration profile for a film to be deposited on a surface of a substrate during a deposition process for the substrate at a process chamber of a manufacturing system is identified. Data of the target concentration profile is processed using a model. The model outputs a set of deposition process settings that corresponds to the target concentration profile. One or more operations of the deposition process are performed in accordance with the set of deposition process settings.