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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12568625 B1

PDFFull Text
Date of Patent:
Mar. 03, 2026

Filed:

Jun. 19, 2023

Semiconductor device and manufacturing method of semiconductor device

Applicant:

SK Hynix Inc., Icheon-si, KR;

Inventors:

Won Geun Choi, Icheon-si, KR;

Rho Gyu Kwak, Icheon-si, KR;

In Su Park, Icheon-si, KR;

Jung Shik Jang, Icheon-si, KR;

Jung Dal Choi, Icheon-si, KR;

Assignee:

SK hynix Inc., Icheon-si, KR;

Attorney:

WILLIAM PARK AND ASSOCIATES LTD.

Primary Examiner:

Richard A Booth

Int. Cl.
CPC ...
H10B 43/27 (2023.01); H10B 41/10 (2023.01); H10B 41/27 (2023.01); H10B 41/30 (2023.01); H10B 43/10 (2023.01); H10B 43/30 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); H10B 41/10 (2023.02); H10B 41/27 (2023.02); H10B 41/30 (2023.02); H10B 43/10 (2023.02); H10B 43/30 (2023.02);
Abstract

A semiconductor device includes a gate structure including conductive layers and insulating layers that are alternately stacked. The semiconductor device also includes an insulating core located in the gate structure and including a long axis and a short axis. The semiconductor device further includes a first channel pattern and a second channel pattern surrounding the insulating core and located to face each other along the long axis. The semiconductor device additionally includes a barrier pattern surrounding the first channel pattern and the second channel pattern and having different thicknesses along the long axis and the short axis.

Find Patent Forward Citations

Choi, Won. (2026). Semiconductor device and manufacturing method of semiconductor device (U.S. Patent No. 12568625). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12568625

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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