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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12567268 B1

PDFFull Text
Date of Patent:
Mar. 03, 2026

Filed:

May. 16, 2022

Automated nanoscopy system having integrated artifact minimization modules, including embedded nanometer position tracking based on phasor analysis

Applicant:

University of Pittsburgh—of the Commonwealth System of Higher Education, Pittsburgh, PA (US);

Inventors:

Hongqiang MA, Pittsburgh, PA (US);

Yang Liu, Sewickley, PA (US);

Assignee:

University of Pittsburgh—Of the Commonwealth System of Higher Education, Pittsburgh, PA (US);

Attorneys:

Philip E. Levy

Eckert Seamans Cherin & Mellott, LLC

Primary Examiner:

Aaron W Carter

Assistant Examiner:

Alejandro undefined Hernandez

Int. Cl.
CPC ...
G06V 20/69 (2022.01); G02B 21/36 (2006.01); G06T 5/10 (2006.01); G06V 10/25 (2022.01); G06V 10/60 (2022.01); G06V 20/70 (2022.01); G16H 30/40 (2018.01);
U.S. Cl.
CPC ...
G06V 20/693 (2022.01); G02B 21/362 (2013.01); G06T 5/10 (2013.01); G06V 10/25 (2022.01); G06V 10/60 (2022.01); G06V 20/70 (2022.01); G16H 30/40 (2018.01);
Abstract

A method of compensating for focus drift in a microscopy system includes receiving data representing a reference light signal reflected from a sample and received by an image sensor, identifying from the data a peak of the reference light signal, the peak having a maximum intensity value for the reference light signal, extracting a sub-region having a center from the data, the center being located at the peak, calculating a first harmonic of a Fourier transform of the extracted sub-region, estimating a peak position of the reference light signal based on a phase of the first harmonic, and moving the lens system of the microscopy system or the sample in the axial direction using the translation stage based on the estimated position. Also, a system compensating for focus drift in a microscopy system according to the above method.

Find Patent Forward Citations

MA, Hongqiang. (2026). Automated nanoscopy system having integrated artifact minimization modules, including embedded nanometer position tracking based on phasor analysis (U.S. Patent No. 12567268). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12567268

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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