The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2026
Filed:
Jun. 01, 2021
Telefonaktiebolaget Lm Ericsson (Publ), Stockholm, SE;
Fengkai Wan, Bromma, SE;
Jiangning Gao, Solna, SE;
TELEFONAKTIEBOLAGET LM ERICSSON (PUBL), Stockholm, SE;
Abstract
There is provided mechanisms for aligning different DPCs of a physical object. A method is performed by an image processing device. The method comprises obtaining DPCs captured from different orbits around the physical object. The method comprises aligning the DPCs with each other. The method comprises selecting, in a first stage, a first DPC of the DPCs as a first reference DPC and individually aligning all remaining DPCs with the first reference DPC, resulting in a first alignment of the DPCs. The first alignment of the DPCs yields a first value of an alignment metric per each of the DPCs except the first DPC. The method comprises selecting, in a second stage, a second DPC of the DPCs as a second reference DPC and individually aligning all remaining DPCs, except the first DPC, with the second reference DPC, resulting in a second alignment of the DPCs. The second alignment of the DPCs yields a second value of the alignment metric per each of the DPCs except the first DPC and the second DPC. The method comprises selecting, for each of the DPCs except the first DPC and the second DPC, that of the first alignment of the DPCs and the second alignment of the DPCs yielding best value of the alignment metric.