The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2026

Filed:

May. 15, 2024
Applicant:

Kioxia Corporation, Tokyo, JP;

Inventor:

Yoshio Mizuta, Yokkaichi Mie, JP;

Assignee:

Kioxia Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70516 (2013.01); G03F 7/70258 (2013.01); G03F 7/70508 (2013.01);
Abstract

An exposure apparatus according to one embodiment includes a stage and a control device. In an exposure process, the control device is configured to: calculate a calculated value of a magnification component by performing function approximation on measurement results of three or more alignment marks arranged on the substrate; set a first lower limit value and/or a first upper limit value for an alignment correction value of a magnification component; in a case where the first lower limit value is set and the calculated value is less than the first lower limit value, set the alignment correction value of the magnification component to a second correction value that is larger than the calculated value and smaller than the first correction value.


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