The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2026
Filed:
May. 19, 2022
Applicant:
Eth Zurich, Zürich, CH;
Inventors:
Assignee:
ETH ZURICH, Zurich, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); G03F 7/2049 (2013.01); G03F 7/705 (2013.01);
Abstract
A method is indicated for producing a nano-structured element () made of hexagonal boron nitride (hBN). The method comprises the steps of a.) generating a relief structure () in the surface () of a resist (), the resist in particular being a polymer resist (); of b.) placing the resist () on the hBN-element (); and of c.) transferring the relief structure () from the resist () into the hBN-element () by means of etching. Furthermore, a device is indicated comprising one or several nano-structured hBN-elements (), the one or several hBN-elements () having a relief structure () provided for the targeted influencing of the electronic, optical and/or mechanical properties of the device.