The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2026

Filed:

Dec. 08, 2023
Applicant:

Jws Technology Co., Ltd., New Taipei, TV;

Inventors:

Cheng-Tu Wang, New Taipei, TW;

Pang-Hung Liao, New Taipei, TW;

Chih-Wei Chen, New Taipei, TW;

Assignee:

JWS TECHNOLOGY CO., LTD., New Taipei City, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F28D 15/04 (2006.01);
U.S. Cl.
CPC ...
F28D 15/043 (2013.01); F28D 15/046 (2013.01); F28F 2215/04 (2013.01);
Abstract

This disclosure is directed to a three-dimensional vapor chamber device having a thermal base, a vertical thermal plate arranged up-right on the thermal base, and a working fluid accommodated in the thermal base and may flow to the vertical thermal plate. A first chamber having a first capillary structure is defined in the thermal base. A second chamber having a second capillary structure is defined in the vertical thermal plate. The first chamber and the second chamber are connected with an inlet and a return port. The second chamber has a flow channel structure connected between the inlet and the return port. The working fluid may flow to the second chamber through the inlet, pass the flow channel structure and return to the first chamber through the return port, so to define a specific flow path leading to a desirable and stable heat transfer efficiency.


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