The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2026

Filed:

May. 06, 2021
Applicant:

Taiyo Nippon Sanso Corporation, Tokyo, JP;

Inventors:

Hayato Murata, Tokyo, JP;

Tadaki Mizuno, Tokyo, JP;

Keisuke Andachi, Tokyo, JP;

Katsumasa Suzuki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/30 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/303 (2013.01); C23C 16/45512 (2013.01); C23C 16/45523 (2013.01); C23C 16/52 (2013.01);
Abstract

One object of the present invention is to provide a method for producing a metal nitride film that has a high film formation rate and excellent productivity. The present invention provides a method for producing a metal nitride film in which a metal nitride film is formed on at least a part of a surface of a substrate to be processed by chemical vapor deposition using a metal compound raw material and a nitrogen-containing compound raw material, wherein the nitrogen-containing compound raw material contains hydrazine and ammonia.


Find Patent Forward Citations

Murata, Hayato. (2026). Device for supplying a mixed gas, device for producing metal nitride film, and method for producing metal nitride film (U.S. Patent No. 12565699). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12565699

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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