The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2026

Filed:

Jul. 19, 2022
Applicant:

Xiamen San'an Optoelectronics Co., Ltd., Xiamen, CN;

Inventor:

Daqian Ye, Tianjin, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10H 20/816 (2025.01); H10H 20/812 (2025.01); H10H 20/825 (2025.01);
U.S. Cl.
CPC ...
H10H 20/816 (2025.01); H10H 20/812 (2025.01); H10H 20/8252 (2025.01);
Abstract

An epitaxial structure includes an n-type layer, a p-type layer, an active layer, and a current spreading layer. The active and current spreading layers respectively have first and third concentration profiles of indium which respectively include first and third characteristic peaks. A heavily doped layer formed between the active and current spreading layers has a second concentration profile of silicon with a second characteristic peak. A ratio of a first minimum horizontal distance between peak tops of first and third characteristic peaks, to a second minimum horizontal distance between peak tops of second and third characteristic peaks, is less than one seventh.


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