The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2026

Filed:

Mar. 25, 2024
Applicant:

Nvidia Corporation, Santa Clara, CA (US);

Inventors:

Animesh Khemka, Fremont, CA (US);

Nikhil Krishna Parab, Fremont, CA (US);

Assignee:

NVIDIA Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 19/00 (2011.01); G06T 7/136 (2017.01); G06T 7/187 (2017.01); G06T 7/55 (2017.01); G06T 15/00 (2011.01); G06V 10/10 (2022.01); G06V 10/26 (2022.01); G06V 10/44 (2022.01); G06V 10/46 (2022.01); G06V 20/70 (2022.01);
U.S. Cl.
CPC ...
G06V 10/46 (2022.01); G06T 7/136 (2017.01); G06T 7/187 (2017.01); G06T 7/55 (2017.01); G06T 15/005 (2013.01); G06T 19/00 (2013.01); G06V 10/16 (2022.01); G06V 10/26 (2022.01); G06V 10/457 (2022.01); G06V 20/70 (2022.01); G06T 2207/20084 (2013.01); G06T 2207/20212 (2013.01); G06T 2219/004 (2013.01);
Abstract

A first synthetic image including a first pattern and a second synthetic image including a second pattern are processed to generated a stitched image comprising a modified version of the first synthetic image and a modified version of the second synthetic image. One or more features of the first pattern are deformed in the modified version of the first synthetic image and one or more features of the second pattern are deformed in the modified version of the second synthetic image. Pixel areas are determined for each feature of the modified version of the first synthetic image and for each feature of the modified version of the second synthetic image. Feature densities are determined for one or more regions of the stitched image based on the determined pixel areas.


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