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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12560916 B1

PDFFull Text
Date of Patent:
Feb. 24, 2026

Filed:

Nov. 28, 2022

Adjusting chamber performance by equipment constant updates

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Sidharth Bhatia, Santa Cruz, CA (US);

Roger Lindley, Santa Clara, CA (US);

Upendra Ummethala, Cupertino, CA (US);

Thomas Li, Santa Clara, CA (US);

Michael Howells, San Jose, CA (US);

Steven Babayan, Los Altos, CA (US);

Mimi-Diemmy Dao, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Lowenstein Sandler LLP

Primary Examiner:

Ronald D Hartman, Jr

Int. Cl.
CPC ...
G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
G05B 19/41865 (2013.01); G05B 19/4188 (2013.01); G05B 19/41885 (2013.01); G05B 2219/45031 (2013.01);
Abstract

A method includes receiving, by a processing device, first trace data associated with a first processing chamber, wherein the first processing chamber satisfies one or more performance metrics. The method further includes generating target trace data based on the first trace data associated with the first processing chamber. The method further includes receiving second trace data associated with a second processing chamber, wherein the second processing chamber does not satisfy the one or more performance metrics. The method further includes generating, based on the target trace data and the second trace data, a first recommended corrective action associated with the second processing chamber, wherein the first recommended corrective action includes updating one or more equipment constants of the second processing chamber. The method further includes performing the first recommended corrective action.

Find Patent Forward Citations

Bhatia, Sidharth. (2026). Adjusting chamber performance by equipment constant updates (U.S. Patent No. 12560916). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12560916

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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