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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12560861 B1

PDFFull Text
Date of Patent:
Feb. 24, 2026

Filed:

Jun. 13, 2022

Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Tetsuya Shimizu, Shizuoka, JP;

Tsukasa Yamanaka, Shizuoka, JP;

Yukihisa Kawada, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

JCIPRNET

Primary Examiner:

Daborah Chacko-Davis

Int. Cl.
CPC ...
G03F 7/32 (2006.01); G03F 1/68 (2012.01); G03F 1/86 (2012.01); G03F 7/00 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01); H01J 49/10 (2006.01);
U.S. Cl.
CPC ...
G03F 1/68 (2013.01); G03F 1/86 (2013.01); G03F 7/0012 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/32 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01J 49/105 (2013.01);
Abstract

A container for storing a chemical fluid for manufacturing an electronic material, in which after an inspection solution charges the container and stored at 25° C. for 30 days, a sum of a concentration of particulate metal including an iron atom, a concentration of particulate metal including a copper atom, and a concentration of particulate metal including a zinc atom which are measured by a Single Particle ICP-MASS method in the inspection solution is 100 ppt or less.

Find Patent Forward Citations

Shimizu, Tetsuya. (2026). Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method (U.S. Patent No. 12560861). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12560861

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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