The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2026

Filed:

Dec. 04, 2019
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Durairaj Baskaran, Bridgewater, NJ (US);

MD S. Rahman, Flemington, NJ (US);

Victor Monreal, Breinigsville, PA (US);

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 212/08 (2006.01); C08F 212/32 (2006.01); C08F 220/14 (2006.01); C09D 5/00 (2006.01); C09D 125/06 (2006.01); C09D 133/06 (2006.01); C09D 133/12 (2006.01); C09D 153/00 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
C09D 133/068 (2013.01); C08F 212/08 (2013.01); C08F 220/14 (2013.01); C09D 5/002 (2013.01); C09D 5/008 (2013.01); C09D 125/06 (2013.01); C09D 153/00 (2013.01); H01L 21/0271 (2013.01); C08F 2438/00 (2013.01); C08F 2800/10 (2013.01);
Abstract

The present invention relates to a random copolymer comprising repeat units of structure (I), (II), (III), and (IV). The invention also pertains to a neutral layer composition comprised of said random copolymer and also pertains to the use of said neutral layer composition to make a crosslinked neutral layer film on a substrate, which can enable self-assembly of a film of a block copolymer overlying said crosslinked neutral layer, wherein said block copolymer contains etch resistant and etchable block, and whose self-assembled pattern is used, through etching, to create either an array of contact holes or posts in said substrate.


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