The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2026

Filed:

Sep. 15, 2020
Applicant:

Korea Advanced Institute of Science and Technology, Daejeon, KR;

Inventors:

Sung Gap Im, Daejeon, KR;

Doheung Kim, Daejeon, KR;

Wontae Jang, Daejeon, KR;

Keonwoo Choi, Daejeon, KR;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 1/00 (2006.01); C08G 75/14 (2006.01); C08L 81/04 (2006.01); C23C 16/448 (2006.01);
U.S. Cl.
CPC ...
B05D 1/60 (2013.01);
Abstract

The present invention relates to a method of preparing a polymer film using chemical vapor deposition using sulfur as an initiator (sCVD) capable of manufacturing a polymer film through polymerization of sulfur and a monomer using gas-phase sulfur as an initiator. In the manufactured polymer film, any of various monomers and sulfur can be polymerized into a copolymer, and it is possible to manufacture a polymer film having a high content of sulfur, an excellent refractive index, and excellent transmittance.


Find Patent Forward Citations

Im, Sung. (2026). Polymer film using chemical vapor deposition using sulfur as initiator (scvd), method of preparing the same and apparatus for preparing the same (U.S. Patent No. 12558705). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12558705

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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