The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
Sep. 16, 2021
The Hong Kong University of Science and Technology, Hong Kong, CN;
The Hong Kong University of Science and Technology, Hong Kong, CN;
Abstract
In particles removal with extremely high filtration efficiency and the ability to block submicron airborne particles by a sieving mechanism is provided. This novel nanoporous filter advantageously combines extremely high transmittance for visible light and ultraviolet light, reusability after cleaning or disinfection by ultraviolet irradiation or simple washing, a customizable sieving pore size ranging from a few nanometers to 500 nanometers, and the ability to carry bactericidal, virucidal or other reagents or particles on the nano or micro scale.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile