The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
Dec. 16, 2022
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Edap-tms, Vaulx en Velin, FR;
Sylvain Chatillon, Palaiseau, FR;
Michel Cardoso, Boulogne-Billancourt, FR;
Nicolas Guillen, Fontaines sur Saone, FR;
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris, FR;
EDAP-TMS, Vaulx en Velin, FR;
Abstract
A parameterising method and system integrated within a high-intensity focused ultrasound (HIFU) treatment device. The parameterising system includes a real-time simulation unit that makes it possible to predict, on the basis of geometric and physiological parameters of tissue regions in the area to be treated, and treatment parameters, the distribution of the ultrasonic field within the area. The computation is performed in real time by means of a metamodel: the ultrasonic field is estimated from an interpolation of maps of the ultrasonic field which are pre-computed and stored in a database, the maps being associated with different values of the geometric and physiological parameters of the tissue regions in question. The thermal dose applied at each point during treatment is subsequently computed and the tissue response is estimated. It is possible for the practitioner to check at any time that the simulated treatment is being used in accordance with tissue regions to be necrotised and tissue regions to be spared. The treatment parameters can be iteratively adjusted in order to conform to the objective.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile