The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Apr. 09, 2019
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Kazuhiro Nishimura, Fukuoka, JP;

Makoto Ueno, Fukuoka, JP;

Shintaro Araki, Tokyo, JP;

Atsunobu Kawamoto, Tokyo, JP;

Masanori Tomioka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/31 (2006.01); H01L 23/29 (2006.01); H10D 62/10 (2025.01); H10D 62/832 (2025.01);
U.S. Cl.
CPC ...
H01L 23/3171 (2013.01); H01L 23/3135 (2013.01); H01L 23/3192 (2013.01); H01L 23/293 (2013.01); H01L 23/296 (2013.01); H01L 23/298 (2013.01); H10D 62/106 (2025.01); H10D 62/8325 (2025.01);
Abstract

The present invention relates to a semiconductor device including: a semiconductor substrate having: an active region through which a main current flows; and a termination region around the active region; a polyimide film disposed in the active region and the termination region; and a passivation film disposed as a film underlying the polyimide film, wherein the termination region includes, in order from a side of the active region, a breakdown voltage holding region and an outermost peripheral region, the polyimide film is disposed except for a dicing remaining portion of the outermost peripheral region, and the passivation film is disposed, as the underlying film, at least in a region where the polyimide film is disposed.


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