The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Aug. 10, 2021
Applicant:

Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E.v., Munich, DE;

Inventors:

Konrad Seidel, Dresden, DE;

Maximilian Lederer, Dresden, DE;

Ricardo Revello, Dresden, DE;

David Lehninger, Dresden, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 64/68 (2025.01); H01L 21/02 (2006.01); H01L 21/3105 (2006.01); H10D 30/69 (2025.01); H10D 1/68 (2025.01);
U.S. Cl.
CPC ...
H01L 21/02356 (2013.01); H01L 21/02181 (2013.01); H01L 21/02189 (2013.01); H01L 21/02194 (2013.01); H10D 1/68 (2025.01); H10D 30/701 (2025.01);
Abstract

A method for producing a ferroelectric layer or antiferroelectric layer in which a layer of a paraelectric material already deposited on a surface of a substrate with a layer thickness of at least two crystallographic unit cells is introduced into an alternating electric field. The alternating electric field is repeatedly cycled between a positive electric field strength and a negative electric field strength of amplitude greater than the coercivity field strength of the material such that the layer of paraelectric material forms a polarization.


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