The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Apr. 12, 2023
Applicant:

Magnolia White Corporation, Tokyo, JP;

Inventors:

Hirofumi Mizukoshi, Tokyo, JP;

Kaichi Fukuda, Tokyo, JP;

Takanobu Takenaka, Tokyo, JP;

Masaru Takayama, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/50 (2006.01); H10K 71/10 (2023.01); H10K 71/60 (2023.01);
U.S. Cl.
CPC ...
H10K 71/60 (2023.02); C23C 14/50 (2013.01); H10K 71/10 (2023.02);
Abstract

According to one embodiment, a processing substrate is prepared. An organic layer is formed. An etching stopper layer is formed. The forming the etching stopper layer includes, in a first mode, inclining an evaporation source, and depositing a material emitted from the evaporation source while relative positions of the evaporation source and the processing substrate are changed, and in a second mode, inclining the evaporation source in a manner different from the first mode, and depositing the material emitted from the evaporation source while the relative positions of the evaporation source and the processing substrate are changed in an opposite manner of the first mode.


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