The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Dec. 10, 2021
Mq Semi Ag, Zug, CH;
Munaf Rahimo, Solothurn, CH;
MQ SEMI AG, Zug, CH;
Abstract
A Metal Oxide Semiconductor (MOS) transistor cell design has a source region and a first base layer extending in a third dimension. When a control voltage greater than a threshold value is applied on the gate trench, electrons flow from a singular point within the source region, into a radial MOS channel formed on the lateral walls of those trench regions surrounded by the first base layer, but not abutting on the higher doped second base layer. The MOS channel width is determined by a quadrant centred on the singular point and with a radius equal to the separation region between the singular point and the maximum surface doping concentration point in the first base layer.