The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Jul. 27, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventor:

Sathya Shrinivas Chary, San Francisco, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 3/84 (2006.01); C23C 16/48 (2006.01); H05B 1/02 (2006.01); H05B 3/00 (2006.01); H05B 3/03 (2006.01); H05B 3/06 (2006.01);
U.S. Cl.
CPC ...
H05B 3/84 (2013.01); C23C 16/481 (2013.01); H05B 1/0233 (2013.01); H05B 3/03 (2013.01); H05B 3/06 (2013.01); C23C 16/482 (2013.01); H05B 3/0047 (2013.01); H05B 2203/007 (2013.01); H05B 2214/04 (2013.01);
Abstract

A method and apparatus for heating a transparent component within a semiconductor processing chamber is described. The transparent component is heated using a transparent heater coupled to the transparent component. The transparent heater includes a support base, an electrode layer, and a capping layer. The electrode layer is a heating element. The transparent heater has an optical transparency of greater than about 80% at a wavelength which is emitted by one or more radiation sources within the processing chamber. The transparent heater is a flexible transparent heater or is formed of a plurality of sub-heaters.


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