The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

May. 18, 2023
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventors:

Vasanthan Raghavan, West Windsor Township, NJ (US);

Mustafa Emara, Munich, DE;

Marco Papaleo, Bologna, IT;

Junyi Li, Fairless Hills, PA (US);

Assignee:

QUALCOMM Incorporated, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B 7/185 (2006.01); H04B 7/06 (2006.01); H04W 52/42 (2009.01);
U.S. Cl.
CPC ...
H04B 7/18513 (2013.01); H04B 7/0617 (2013.01); H04W 52/42 (2013.01);
Abstract

Various aspects of the present disclosure generally relate to wireless communication. In some aspects, a network node may determine an effective isotropic radiated power (EIRP) limit for a communication to be transmitted by the network node, based at least in part on an EIRP mask and a spatial angle associated with the communication. The network node may transmit the communication in accordance with the EIRP limit. Numerous other aspects are described.


Find Patent Forward Citations

Raghavan, Vasanthan. (2026). Generating effective isotropic radiated power masks for interference management (U.S. Patent No. 12556265). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12556265

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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