Batch type substrate processing apparatus

Abstract

Provided is a batch type substrate processing apparatus that generates plasma by a plurality of electrodes to perform a processing process on a substrate. The batch type substrate processing apparatus includes a reaction tube, a plurality of electrodes, and an electrode protection part. The plurality of electrodes includes first and second power supply electrodes spaced apart from each other and first and second ground electrodes provided between the first power supply electrode and the second power supply electrode to correspond to the first power supply electrode and the second power supply electrode, respectively. The electrode protection part includes a plurality of first electrode protection tubes which have inner spaces in which the first and second power supply electrodes are inserted, respectively, a plurality of second electrode protection tubes which have inner spaces in which the first and second ground electrodes are inserted, respectively, and a plurality of bridge parts configured to connect upper ends of the first electrode protection tube and the second electrode protection tube, which face each other, to each other, respectively.