The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Feb. 05, 2016
Applicant:

Spts Technologies Limited, Newport, GB;

Inventors:

Stephen R Burgess, Gwent, GB;

Anthony Paul Wilby, Bristol, GB;

Clive L Widdicks, Bristol, GB;

Ian Moncrieff, Wotton-under-Edge, GB;

P Densley, Newport, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); C23C 14/358 (2013.01); H01J 37/321 (2013.01); H01J 37/32146 (2013.01); H01J 37/32477 (2013.01); H01J 37/3411 (2013.01); H01L 21/3065 (2013.01); H01J 2237/0262 (2013.01); H01J 2237/327 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01);
Abstract

A plasma producing apparatus for plasma processing a substrate Includes a chamber having an interior surface, a plasma production device for producing an inductively coupled plasma within the chamber, a substrate support for supporting the substrate during plasma processing, and a Faraday shield disposed within the chamber for shielding at least part of the interior surface from material removed from the substrate by the plasma processing. The plasma production device includes an antenna and a RF power supply for supplying RF power to the antenna with a polarity which is alternated at a frequency of less than or equal to 1000 Hz.


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