The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Nov. 30, 2021
International Business Machines Corporation, Armonk, NY (US);
Ye Wang, Xi'an, CN;
Xiang Yu Yang, Xi'an, CN;
Yong Wang, Xi'an, CN;
Deng Xin Luo, Xi'an, CN;
Zhong Fang Yuan, Xi'an, CN;
Zhi Yong Jia, Xi'an, CN;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method, computer program product, and computer system for finding outliers in multi-dimensional time series samples. Each time series sample is divided into at least 2 sub samples having equal time duration. At least one prediction model is pre-trained using the sub samples and a prediction result for each sub sample for each prediction model is obtained by executing the pre-trained prediction models with the time series samples as input. A Shapely value corresponding to each prediction result is sub samples for each prediction model to generate multiple clusters of Shapely values for each prediction model. Highest ranking Shapely value outliers are determined from analysis of the multiple clusters. Highest ranking outlier sub samples corresponding to the highest ranking Shapely value outliers are identified.