The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
May. 02, 2022
Samsung Sdi Co., Ltd., Yongin-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Ran Namgung, Suwon-si, KR;
Hyeon Park, Suwon-si, KR;
Minsoo Kim, Suwon-si, KR;
Daeseok Song, Suwon-si, KR;
Minki Chon, Suwon-si, KR;
Jun Soo Kim, Hwaseong-si, KR;
Hyun-Woo Kim, Seongnam-si, KR;
Hyun-Ji Song, Anyang-si, KR;
Young Joo Choi, Hwaseong-si, KR;
Suk-Koo Hong, Hwaseong-si, KR;
Samsung SDI Co., Ltd., Yongin-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A resist topcoat composition and a method of forming patterns utilizing the resist topcoat composition are disclosed. The resist topcoat composition includes an acrylic polymer comprising a structural unit comprising a hydroxy group and a fluorine; a mixture comprising a first acid compound comprising at least one fluorine; and a second acid compound different from the first acid compound and comprising at least one fluorine, the first acid compound and the second acid compound are each independently selected from a sulfonic acid compound and a sulfonimide compound, the first acid compound and the second acid compound being in a weight ratio of about 1:0.1 to about 1:50; and a solvent.