The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Oct. 27, 2022
Rockwell Collins, Inc., Cedar Rapids, IA (US);
Venkata A. Sishtla, Cedar Rapids, IA (US);
Xingming Wang, Marion, IA (US);
James B. West, Cedar Rapids, IA (US);
Jacob G. Teague, West Melbourne, FL (US);
Rockwell Collins, Inc., Cedar Rapids, IA (US);
Abstract
A system and method for distinguishing targets of interest from main lobe clutter and sidelobe clutter includes an ESA or AESA divided into subarrays. A sum beam power profile is produced via one or more scans of the subarrays, and a difference beam power profile is produced via calculations involving the subarrays. A comparison of the sum beam power profile and the difference beam power profile accentuates signal power disparities between targets of interest and clutter. A threshold is then applied to isolate targets of interest. Different difference beam power profiles may be used for elevation comparisons and azimuth comparisons. Alternatively, subarrays may be selected such that the same difference beam power profile may be used for both elevation and azimuth. Scans may be time multiplexed such that data from different scans may be used to produce the sum beam power profile, the difference beam power profile, or both.