The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Sep. 29, 2023
Uchicago Argonne, Llc, Chicago, IL (US);
Raymond P. Conley, Glen Ellyn, IL (US);
Kael Seaver, Chicago, IL (US);
Deming Shu, Darien, IL (US);
Scott J. Izzo, Standish, MI (US);
Lahsen Assoufid, Chicago, IL (US);
UCHICAGO ARGONNE, LLC, Chicago, IL (US);
Abstract
A high-resolution x-ray reflectometer system that is for characterization of mirrors for use with advanced light sources and includes a table, arc, and sample stage. The table and arc may be made of the same material, in some configurations that material is granite. An x-ray source and detector are mounted on the arc. The arc is movable along the surface of the table in a first direction, and the sample stage is moveable on the table surface in a second direction, perpendicular to the first direction. The sample stage can accommodate a sample with a thickness of 5 cm or more. Vertical lifting stages at each end of the sample stage allow for independent height adjustment of the ends, allowing for tiling of the sample. An autocollimator is mounted at the apex of the arc to characterize the tilt of a sample on the sample stage.