The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Nov. 29, 2023
Applicant:

Hexagon Technology Center Gmbh, Heerbrugg, CH;

Inventors:

Patrick Ilg, Wangen, DE;

Pete Champ, Rickmansworth, GB;

Patryk Wroclawski, Wangen, DE;

Sascha Schiwy, Sennwald, CH;

Kai Imhäuser, Lindau, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G05D 3/12 (2006.01);
U.S. Cl.
CPC ...
G01B 11/005 (2013.01); G05D 3/12 (2013.01);
Abstract

A method for controlling a distance between a non-contact measurement probe head of a CMM and a work piece during a measurement. The method comprises providing steering commands to steer the work piece and/or the probe head through a measuring path comprising measuring positions, performing at a measuring position a measuring step comprising providing distance adjustment steering commands to set the distance between the probe head and the work piece, projecting a primary measuring beam pattern onto the work piece, acquiring a secondary measuring beam pattern originating from an interaction of the primary measuring beam with the work piece, deriving surface information based on the secondary measuring beam pattern, deriving information regarding the distance between the probe head and the work piece, deriving a distance deviation based on a distance target the derived distance information, providing the distance deviation for a distance adjustment performed at a subsequent measuring position.


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