The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
May. 30, 2022
Asahi Kasei Kabushiki Kaisha, Tokyo, JP;
Yusuke Tsuji, Tokyo, JP;
Asahi Kasei Kabushiki Kaisha, Tokyo, JP;
Abstract
Provided are a double raschel knitted fabric having ridges, wherein shape stability of ridges and recesses, seam strength, and tensile resistance of recesses are excellent, and a surface covering material comprising said fabric. The double raschel knitted fabric according to the present invention includes a double-layer knitted fabric having a surface layer and a back layer, and a connecting thread that connects the knitted fabric of the two front and back layers, and a plurality of ridges, and recesses located between the ridges, are formed in at least one knitted fabric of the two front and back layers, the double raschel knitted fabric characterized in that the ridges are formed by combining two or more wales of stitch rows continuing in the warp direction, and the ridges are connected to adjacent ridges on at least one side by sinker loops.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile