The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Feb. 09, 2023
Semes Co., Ltd., Chungcheongnam-do, KR;
Jee Young Lee, Chungcheongnam-do, KR;
Won Geun Kim, Chungcheongnam-do, KR;
Young Dae Chung, Chungcheongnam-do, KR;
Ji Hoon Jeong, Chungcheongnam-do, KR;
Tae Shin Kim, Chungcheongnam-do, KR;
Won Sik Son, Chungcheongnam-do, KR;
SEMES CO., LTD., Chungcheongnam-do, KR;
Abstract
A method of processing a substrate includes an etchant supplying operation of supplying an etchant to a substrate; a puddle operation of, by rotating the substrate at a first rotational speed, forming a liquid film of the etchant supplied to the substrate in a puddle shape; and a thickness adjusting operation of changing a rotational speed of the substrate to a rotational speed different from the first rotational speed to adjust a thickness of the liquid film of the etchant. Using the method, dispersion of the etching rate may be effectively controlled.