The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Aug. 04, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Abhishek Chowdhury, Bangalore, IN;

Nataraj Bhaskar Rao, Bangalore, IN;

Edwin C. Suarez, Pleasanton, CA (US);

Harisha Sathyanarayana, Bangalore, IN;

Diego Ramiro Puente Sotomayor, Phoenix, AZ (US);

Qanit Takmeel, Mesa, AZ (US);

Mohammad Kamruzzaman Chowdhury, Phoenix, AZ (US);

Arun Chakravarthy Chakravarthy, Tamil Nadu, IN;

Assignee:

Applied Materials Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4581 (2013.01); C23C 16/4585 (2013.01);
Abstract

A substrate handling system includes a fixed deposition ring having a plurality of circumferentially spaced notches along an outer edge of the fixed deposition ring, the fixed deposition ring being electrically non-conductive; a moving deposition ring having a plurality of circumferentially spaced recesses formed on a lower surface of the moving deposition ring, the recesses configured to radially align with the notches of the fixed deposition ring, the moving deposition ring having an inner edge and an outer edge, the moving deposition ring being electrically non-conductive; and a plurality of electrically conductive grounding plates each having a base, an intermediate member, and a contact extending from the intermediate member and being spaced from the base, the intermediate members configured to be received in the recesses and extend between the inner edge and the outer edge of the moving deposition ring.


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