The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Nov. 11, 2021
Applicant:
Levitech B.v., Almere, NL;
Inventors:
Vladimir Kuznetsov, Almere, NL;
Jacobus Hubertus Maria Beijersbergen, Almere, NL;
Simon Cornelis Van Der Linde, Houten, NL;
Assignee:
Levitech B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/45529 (2013.01); C23C 16/45551 (2013.01); C23C 16/45565 (2013.01); C23C 16/458 (2013.01); C23C 16/46 (2013.01); H01L 21/67748 (2013.01); H01L 21/67784 (2013.01);
Abstract
An atomic layer deposition apparatus comprising a first single substrate process chamber, a second single substrate process chamber, and a transfer mechanism configured to transfer the substrate between the first and the second process chamber. Wherein both the first and second single substrate process chambers are bounded by a bottom part and a top part for accommodating a substantially flat substrate between them.