The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Jun. 29, 2021
Screen Holdings Co., Ltd., Kyoto, JP;
Yukifumi Yoshida, Kyoto, JP;
SCREEN Holdings Co., Ltd., Kyoto, JP;
Abstract
A substrate processing method includes a processing film forming step in which a processing liquid is supplied to a front surface of a substrate and the processing liquid on the front surface of the substrate is solidified or cured to form a processing film on the front surface of the substrate, an etching facilitating step in which the processing film is subjected to etching function developing processing, thereby facilitating etching at a surface layer portion of the substrate by the processing film, and an etching reducing step in which the processing film is subjected to etching function eliminating processing, thereby reducing the etching at the surface layer portion of the substrate by the processing film in a state that the processing film is kept on the substrate.