The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Dec. 16, 2021
Applicant:
Emd Millipore Corporation, Burlington, MA (US);
Inventors:
Rebecca Rodenhiser, Jaffrey, NH (US);
Salvatore Giglia, Bedford, MA (US);
Christopher Johnson, Bedford, NH (US);
Assignee:
EMD Millipore Corporation, Burlington, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 65/10 (2006.01); G01N 15/08 (2006.01);
U.S. Cl.
CPC ...
B01D 65/102 (2013.01); G01N 15/0826 (2013.01); G01N 2015/084 (2013.01);
Abstract
The disclosure herein relates to a method of reducing background noise during integrity testing of membrane filter to increase sensitivity and more effectively disposition failing membrane filters.
Rodenhiser, Rebecca. (2026). Secondary statistical cutoff methodology for gas-liquid diffusion integrity testing (U.S. Patent No. 12551852). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12551852
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile